Substrate processing apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsTaiki HINODE, Takashi OTA, Naoki FUJIWARA
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Abstract
A substrate processing apparatus includes a spin chuck for holding a substrate horizontally, a phosphoric acid supply device for supplying phosphoric acid aqueous solution onto the upper surface of the substrate held on the spin chuck to form a liquid film of phosphoric acid aqueous solution covering the entire upper surface of the substrate, a heating device for heating the substrate with the liquid film of phosphoric acid aqueous solution held thereon and a pure water supply device for supplying pure water onto the liquid film of phosphoric acid aqueous solution.
Claims27
A substrate processing apparatus comprising:
- a substrate holding device for holding a substrate horizontally;
- a phosphoric acid supply device for supplying phosphoric acid aqueous solution onto an upper surface of the substrate held on the substrate holding device to form a liquid film of phosphoric acid aqueous solution covering an entire upper surface of the substrate;
- a heating device for heating the substrate with the liquid film of phosphoric acid aqueous solution held thereon;
- and
- a water supply device for supplying water onto the liquid film of phosphoric acid aqueous solution.
Dependencies are inferred from the claim text.