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US 2014/0230910 A1Published application
Split-channel gas flow control
AssigneeAgilent Technologies, Inc.
InventorsXiao-Sheng GUAN, Yuan CHU, Qiang XU
Life of this patent
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Abstract
An apparatus comprises a proportional valve, a first channel connected to the proportional valve, a flow sensor connected to the first channel and configured to measure gas flow in the first channel, a split channel connected to the first channel at a location between the proportional valve and the flow sensor, and a control component connected between the flow sensor and the proportional valve and configured to control gas flow in the first channel.
Claims20
An apparatus, comprising:
- a proportional valve;
- a first channel connected to the proportional valve;
- a flow sensor connected to the first channel and configured to measure gas fit w in the first channel;
- a split channel connected to the first channel at a location between the proportional valve and the flow sensor;
- and
- a control component connected between the flow sensor and the proportional valve and configured to control gas flow in the first channel.
3 more elements
A method, comprising:
- providing gas to a first channel and a split channel through a proportional valve, wherein the split channel is connected to the first channel at a first location downstream from the proportional valve;
- monitoring gas flow in the first channel at a second location downstream from the first location;
- and
- controlling the proportional valve to adjust the gas flow in the first channel based on the monitored flow.
1 more element
Dependencies are inferred from the claim text.