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US 2014/0230734 A1Published application
Deposition apparatus
AssigneeLG Innotek Co., Ltd.
InventorHeung Teak Bae
Life of this patent
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Abstract
Disclosed is a deposition apparatus. The deposition apparatus includes a susceptor into which reactive gas is introduced, and a wafer holder provided in the susceptor to receive a substrate or a wafer. The wafer holder comprises a gas feeding part provided at a lateral side of the wafer holder.
Claims10
A deposition apparatus comprising:
- a susceptor into which reactive gas is introduced;
- and
- a wafer holder provided in the susceptor to receive a substrate or a wafer,
- wherein the wafer holder comprises a gas feeding part provided at a lateral side of the wafer holder.
1 more element
Dependencies are inferred from the claim text.