Vacuum processing apparatus

A vacuum processing apparatus, comprising:

• a process chamber;
• a load lock chamber connected to the process chamber;
• and
• a transfer device configured to transfer a substrate from the load lock chamber to the process chamber,
• wherein the transfer device is configured to move the substrate by gravity,
• wherein the transfer device comprises:
• a guide configured to form a transfer path when the substrate moves by the gravity;
• and
• a stopper configured to limit movement of the substrate by the gravity when holding the substrate, and cancel the limitation when moving the substrate, and
• wherein the guide includes:
• a pair of first guides configured to guide two surfaces of the substrate, respectively, to regulate the movement of the substrate in a thickness direction;
• and
• a pair of second guides configured to guide, out of four sides of the substrate, two sides along the transfer path so as to regulate the movement of the substrate in a widthwise direction, and
• the pair of guides are formed by wires so as to guide the substrate in a state in which the two surfaces of the substrate are exposed.