Material modification assembly and method for use in the modification of material substrates

A method for use in a modification of a material substrate, said method comprising:

• coupling an energy source to a computing device;
• generating at least one pattern script for a modification to a material substrate, via the computing device, wherein the at least one pattern script is based on at least one parameter of the modification;
• generating at least one process script that includes a type of a plurality of pulse scripts to be used in conjunction with a plurality of light beams generated by the energy source for the modification to the material substrate, via the computing device, wherein the plurality of pulse scripts are based on at least one parameter of the interaction between the energy source and the material substrate;
• combining the at least one pattern script with the at least one process script, via the computing device;
• generating a plurality of command signals that are based on the combination of the at least one pattern script and the at least one process script, via the computing device;
• and
• transmitting the plurality of command signals to one or more additional component devices that are coupled to the computing device to enable the one or more component devices to facilitate modifying the plurality of light beams being generated by the energy source for the modification to the material substrate such that the modification includes a pattern on at least a surface of the material substrate having dimensions and includes two or more discrete material alterations or changes spatially overlapped within the pattern.

A system comprising:

• a material substrate;
• a material modification assembly positioned proximate to said material substrate, said material modification assembly comprising:
• an energy source positioned proximate to said material substrate, wherein said energy source is configured to generate a plurality of light beams for a modification to said material substrate;
• and
• a computing device coupled to said energy source, wherein said computing device configured to:
• generate at least one pattern script for the modification to said material substrate, wherein the at least one pattern script is based on at least one parameter of the modification;
• generate at least one process script that includes a type of a plurality of pulse scripts to be used in conjunction with the plurality of light beams generated by said energy source for the modification to said material substrate, wherein the plurality of pulse scripts are based on at least one parameter of the interaction between said energy source and said material substrate;
• combine the at least one pattern script with the at least one process script;
• generate a plurality of command signals that are based on the combination of the at least one pattern script and the at least one process script;
• and
• transmit the plurality of command signals to one or more additional component devices of said material modification assembly that are coupled to said computing device to enable the one or more component devices to facilitate modifying the plurality of light beams being generated by said energy source for the modification to said material substrate such that the modification includes a pattern on at least a surface of the material substrate having dimensions and includes two or more discrete material alterations or changes spatially overlapped within the pattern.