Phenol-based self-crosslinking polymer and resist underlayer film composition including same
AssigneeDongjin Semichem Co., Ltd.
InventorsJeong-Sik Kim, Jae-Hyun Kim, Jae-Woo Lee
Life of this patent
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Abstract
A phenolic self-crosslinking polymer whose self-crosslinking reaction at a heating step is performed without additives for hardening the polymer, and a composition of resist-underlayer-film containing the same, are disclosed. The phenolic self-crosslinking polymer being selected from a group consisting of a polymer represented by Formula 1, a polymer represented by Formula 2 and a polymer represented by Formula 3:
Claims7
A phenolic self-crosslinking polymer selected from a group consisting of a polymer represented by following Formula 1, a polymer represented by following Formula 2 and a polymer represented by following Formula 3.
- wherein in Formulas 1 to 3, R1, R2, R4, R5, R8 and R9 each is independently a hydrogen atom or chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 20 carbon atoms, which contains or does not contain a hetero atom, R3, R7 and R10 each is independently chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 30 carbon atoms, which contain or does not contain a hetero atom, R6 is independently chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 40 carbon atoms, m is 1 or 2, and when m is 2, each repeating unit of m is connected to each other directly or through chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 40 carbon atoms, and n is an integer of 0 to 100.
A composition of resist-underlayer-film, comprising a phenolic self-crosslinking polymer;
- and an organic solvent,
- the phenolic self-crosslinking polymer being selected from a group consisting of a polymer represented by following Formula 1, a polymer represented by following Formula 2 and a polymer represented by following Formula 3,
- wherein in Formulas 1 to 3, R1, R2, R4, R5, R8 and R9 each is independently a hydrogen atom or chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 20 carbon atoms, which contains or does not contain a hetero atom, R3, R7 and R10 each is independently chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 30 carbon atoms, which contain or does not contain a hetero atom, R6 is independently chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 40 carbon atoms, m is 1 or 2, and when m is 2, each repeating unit of m is connected to each other directly or through chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 40 carbon atoms, and n is an integer of 0 to 100.
A method for forming resist-underlayer-film, comprising the steps of:
- coating, on a wafer, a composition containing a phenolic self-crosslinking polymer and an organic solvent;
- and
- heating the wafer at 240 to 400° C.,
- the phenolic self-crosslinking polymer being selected from a group consisting of a polymer represented by following Formula 1, a polymer represented by following Formula 2 and a polymer represented by following Formula 3,
- wherein in Formulas 1 to 3, R1, R2, R4, R5, R8 and R9 each is independently a hydrogen atom or chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 20 carbon atoms, which contains or does not contain a hetero atom, R3, R7 and R10 each is independently chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 30 carbon atoms, which contain or does not contain a hetero atom, R6 is independently chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 40 carbon atoms, m is 1 or 2, and when m is 2, each repeating unit of m is connected to each other directly or through chain type, branch type, single ring type or multi-ring type, saturated or unsaturated hydrocarbon group of 1 to 40 carbon atoms and n is an integer of 0 to 100.
Dependencies are inferred from the claim text.