Method for forming solar cells

A method for forming a thin film solar cell comprising:

• depositing a conductive bottom electrode layer on a substrate;
• cutting a first set of scribe lines in the bottom electrode layer, the first set of scribe lines forming a first set of micro-channels in the bottom electrode layer;
• depositing an absorber layer on the bottom electrode layer, whereby the absorber layer is interconnected to the substrate through the first set of micro-channels formed by the first set of scribe lines;
• depositing a buffer layer on the absorber layer;
• cutting a second set of scribe lines in the absorber layer, the second set of scribe lines forming a second set of micro-channels with exposed sidewalls in the absorber layer from exposed portions of the absorber layer and the buffer layer;
• depositing a top electrode layer on the buffer layer after cutting the second set of scribe lines, whereby material from the top electrode layer at least partially filling the second set of micro-channels and interconnect to the bottom electrode layer thereby preventing the buffer layer from acting as a barrier between the top and bottom electrode layers;
• cutting a third set of scribe lines extending completely through the top electrode, the buffer layer, the absorber layer, and the bottom electrode layer, the third set of scribe lines forming a third set of micro-channels isolating said thin film solar cell;
• and
• depositing a first moisture barrier layer made of a water-insoluble material on the top electrode layer, whereby all exposed surfaces of the top electrode layer material within the second set of micro-channels and the third set of micro-channels are covered with the first moisture barrier layer material for protection against water and oxygen damage to the top electrode layer material within the second set of micro-channels and the third set of micro-channels.

A method for forming a thin film solar cell comprising:

• depositing a conductive bottom electrode layer on a substrate;
• cutting a first set of scribe lines in the bottom electrode layer, the first set of scribe lines forming a first set of micro-channels in the bottom electrode layer;
• depositing an absorber layer on the bottom electrode layer, whereby the absorber layer is interconnected to the substrate through the first set of micro-channels formed by the first set of scribe lines;
• depositing a buffer layer on the absorber layer;
• cutting a second set of scribe lines in the absorber layer, the second set of scribe lines forming a second set of micro-channels with exposed sidewalls in the absorber layer from exposed portions of the absorber layer and the buffer layer;
• depositing a top electrode layer on the buffer layer after cutting the second set of scribe lines, whereby material from the top electrode layer at least partially filling the second set of micro-channels and interconnect to the bottom electrode layer thereby preventing the buffer layer from acting as a barrier between the top and bottom electrode layers;
• depositing a first moisture barrier layer made of a water-insoluble material on the top electrode layer, whereby all exposed surfaces of the top electrode layer material within the second set of micro-channels are covered with the first moisture barrier layer material for protection against water and oxygen damage to the top electrode layer material within the second set of micro-channels;
• cutting a third set of scribe lines extending completely through the first moisture barrier layer, the top electrode, the buffer layer, the absorber layer, and the bottom electrode layer, the third set of scribe lines forming a third set of micro-channels isolating said thin film solar cell;
• and
• depositing a second moisture barrier layer made of a water-insoluble material over the first moisture barrier layer, whereby all exposed surfaces of the top electrode layer material within the second set of micro-channels are covered with the first and second moisture barrier layer materials for protection against water and oxygen damage to the top electrode layer material within the second set of micro-channels, and all exposed surfaces of the top electrode layer material within the third set of micro-channels are covered with the second moisture barrier layer material for protection against water and oxygen damage to the top electrode material.