Semiconductor manufacturing apparatus and manufacturing method of semiconductor device

A manufacturing method of a semiconductor device using a semiconductor manufacturing apparatus comprising an electrostatic chuck fixing a semiconductor substrate onto a stage within a vacuum chamber, a sensor detecting a height of a surface of the semiconductor substrate, a processor calculating correction values in order to correct a distortion of a pattern transferred onto the surface of the semiconductor substrate by exposure, and an exposure part exposing the surface of the semiconductor substrate to light using the correction values, the method comprising:

• fixing the semiconductor substrate onto the stage;
• detecting the height of the surface of the semiconductor substrate fixed onto the stage by the electrostatic chuck;
• determining whether the surface of the semiconductor substrate is distorted based on the height of the surface of the semiconductor substrate;
• calculating the correction values for the pattern transferred onto the surface of the semiconductor substrate by the exposure based on the height of the surface of the semiconductor substrate when the surface of the semiconductor substrate is distorted;
• and
• exposing the surface of the semiconductor substrate to the light using the correction values.