Negative resist composition and pattern forming method using the same

A coated product comprising a substrate on which surface a vapor deposition film is provided and a layer directly set on the vapor deposition film,

• wherein the vapor deposition film is formed of Cr, Mo, MoSi, TaSi or an oxide or nitride thereof, and
• wherein the layer directly set on the vapor deposition film contains a negative resist composition, comprising:
• (A) an alkali-soluble polymer containing a repeating unit represented by formula (1);
• (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid;
• (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation;
• (D) a quaternary ammonium salt represented by formula (2);
• and
• (E) an aromatic carboxylic acid:
• Formula (1):
• wherein A represents a hydrogen atom, an alkyl group, a halogen atom or a cyano group;
• R1 and R2 each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkoxy group or an alkylcarbonyloxy group;
• and
• n represents an integer of 1 to 3;
• wherein R3 to R6 each independently represents an alkyl group, an alkenyl group, an aryl group or an aralkyl group;
• B− represents an OH group, an R7—CO2− group or an R7—SO3− group;
• and R7 represents an alkyl group, an alkenyl group, an aryl group or an aralkyl group;
• and
• wherein a blending ratio between the quaternary ammonium salt (D) and the aromatic carboxylic acid (E) is (D)/(E)=10 to 90/90 to 10 (by mass).