Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device

A pattern forming method comprising:

• (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I),
• (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II),
• (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and
• (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern, wherein
• the first resin composition (I) contains a first resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer,
• the second resin composition (II) contains a second resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer,
• at least either one of the first resin composition (I) and the second resin composition (II) contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and
• the first resin in the first resin composition (I) is a resin containing a repeating unit having an aromatic ring or the first resin composition (I) further contains an aromatic compound.