Gas barrier film
AssigneeMitsui Chemicals Tohcello, Inc.
InventorsMasako Takano, Kiyotaka Shindo
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Abstract
The present invention aims to provide a transparent gas barrier film having excellent gas barrier properties against oxygen, water vapor and the like especially under high humidity, and showing excellent delamination resistance after hydrothermal treatment. The present invention relates to a gas barrier film comprising: a base film having an inorganic compound layer formed on one side thereof; and a (meth)acrylic silane coupling agent layer and a layer (Y) that are laminated in this order on the inorganic compound layer, which layer (Y) comprises a polymer of a polyvalent metal salt of an unsaturated carboxylic acid compound (a) and a vinyl alcohol polymer (b).
Claims6
A gas barrier film comprising:
- a base film having an inorganic compound layer formed on one side thereof;
- and a (meth)acrylic silane coupling agent layer and an organic barrier layer (Y) that are laminated in this order on said inorganic compound layer, said organic barrier layer (Y) comprising a polymer of a polyvalent metal salt of an unsaturated carboxylic acid compound (a) and a vinyl alcohol polymer (b).
Dependencies are inferred from the claim text.