Deposition of silicon oxide by atmospheric pressure chemical vapor deposition
AssigneeArkema Inc.
InventorsRyan C. Smith, Jeffery L. Stricker
Life of this patent
Estimating the term…
Abstract
The invention provides methods for forming silicon oxide-containing layer(s) on a substrate, such as glass, by heating a substrate, vaporizing at least one precursor comprising a monoalkylsilane having an alkyl group with greater than two carbon atoms to form a vaporized precursor stream, and contacting a surface of the heated substrate with the vaporized precursor stream at about atmospheric pressure to deposit one or more layers comprising silicon oxide onto the surface of the substrate. The invention is particularly useful for applying an anti-iridescent coating to glass in an online float glass process.
Claims23
A method of forming at least one silicon oxide-containing layer on a substrate comprising:
- (a) heating a substrate;
- (b) vaporizing at least one precursor comprising a monoalkylsilane having an alkyl group with greater than two carbon atoms to form a vaporized precursor stream;
- and
- (c) contacting a surface of the heated substrate with the vaporized precursor stream at about atmospheric pressure to deposit at least one layer comprising silicon oxide onto the surface of the substrate.
A silicon oxide-containing thin film obtained by using an atmospheric pressure chemical vapor deposition process comprising:
- (a) heating a substrate;
- and
- (b) contacting a surface of the heated substrate with a precursor gas comprising vaporized monoalkylsilane having an alkyl group with greater than two carbon atoms at about atmospheric pressure to produce the silicon oxide-containing film.
A method of producing at least one anti-iridescent silicon oxide coating on a glass substrate comprising:
- (a) heating a glass substrate;
- (b) vaporizing at least one precursor comprising a monoalkylsilane having an alkyl group with greater than two carbon atoms to form a vaporized precursor stream;
- and
- (c) contacting a surface of the heated glass substrate with the vaporized precursor stream and an oxidant at about atmospheric pressure to deposit at least one layer comprising silicon oxide having a refractive index ranging from about 1.4 to about 2.0 onto the surface of the glass substrate.
Dependencies are inferred from the claim text.