Film-forming material, group iv metal oxide film and vinylenediamide complex

A film-forming material, produced by a process comprising:

• reacting a vinylenediamide complex represented by formula (2) with one or more oxidizing agents selected from the group consisting of oxygen gas, air, ozone, water and hydrogen peroxide:
• wherein:
• M2 represents a titanium atom or a silicon atom;
• each of R6 and R9 independently represents a C1-C12 alkyl group;
• each of R7 and R8 independently represents a hydrogen atom or a C1-C4 alkyl group;
• R10 represents a C1-C6 alkoxy group or a di(C1-C6 alkyl)amino group;
• and
• Q represents a C2-C6 methylene group which is optionally substituted with a C1-C3 alkyl group.

A vinylenediamide complex represented by formula (2):

• wherein:
• M2 represents a titanium atom or a silicon atom;
• each of R6 and R9 independently represents a C3-C12 alkyl group;
• each of R7 and R8 independently represents a hydrogen atom or a C1-C4 alkyl group;
• R10 represents a C1-C6 alkoxy group or a di(C1-C6 alkyl)amino group;
• and
• Q represents a C2-C6 methylene group which is optionally substituted with a C1-C3 alkyl group.

A vinylenediamide complex represented by formula (7):

• wherein:
• M4 represents a zirconium atom or a hafnium atom;
• each of R1 and R4 independently represents an alkyl group having a carbon number of 3 to 12;
• each of R2 and R3 independently represents a hydrogen atom or an alkyl group having a carbon number of 1 to 4;
• and
• R5 represents an alkyl group having a carbon number of 1 to 12 and optionally substituted with a fluorine atom, or QR10 with Q representing a C2-C6 methylene group optionally substituted with a C1-C3 alkyl group and R10 representing a C1-C6 alkoxy group or a di(C1-C6 alkyl)amino group.