Pretreatment method and carbon nanotube formation method
AssigneeTokyo Electron Limited
InventorTakashi Matsumoto
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AssigneeTokyo Electron Limited
InventorTakashi Matsumoto
Estimating the term…
The pretreatment method for carbon nanotube formation according to the present invention comprises a first plasma treatment process in which catalytic metal fine particles are formed by applying plasma to a catalytic metal layer and atomizing the catalytic metal, and a second plasma treatment process in which the catalytic metal fine particles are activated by applying plasma of a gas mixture, in which a hydrogen-containing gas and a nitrogen gas are mixed, to the catalytic metal fine particles. A co-catalyst layer formed of nitride such as TiN and TaN is preferably disposed below the catalytic metal layer. The co-catalyst layer is nitrated by the plasma of the gas mixture including the hydrogen-containing gas and the nitrogen gas and the activation ratio of the catalytic metal fine particles is increased.
A pretreatment method performed prior to a carbon nanotube growth using a CVD method on catalytic metal fine particles formed on a treatment target, the pretreatment method comprising:
A carbon nanotube formation method, comprising:
Dependencies are inferred from the claim text.