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US 2014/0227448 A1Published application
Block copolymer composition and methods relating thereto
AssigneeRohm and Haas Electronic Materials LLC
InventorsPeter Trefonas, Phillip Hustad, Xinyu Gu, Erin Vogel, Valeriy Ginzburg, Shih-Wei Chang, Daniel Murray
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Abstract
A copolymer composition is provided including a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
Claims12
A copolymer composition, comprising:
- a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block;
- and,
- an antioxidant;
- wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol;
- wherein the copolymer composition contains ≧2 wt % antioxidant (based on the weight of the block copolymer) and,
- wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2.
3 more elements
A copolymer composition, comprising:
- a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block;
- wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol;
- wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2;
- and, wherein the block copolymer contains ≦75 wt % of a poly(methyl methacrylate)-block-poly((trimethylsilyl)methyl methacrylate) diblock copolymer.
1 more element
Dependencies are inferred from the claim text.