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US 2014/0227444 A1Published application
Synthesis And Characterization Of First Row Transition Metal Complexes Containing a-Imino Alkoxides As Precursors For Deposition Of Metal Films
AssigneeWayne State University
InventorsCharles H. Winter, Lakmal C. Kalutarage
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Abstract
A compound that is useful for forming a metal by reaction with a reducing agent is described by formula (I): wherein M is a metal selected from Groups 2 through 12 of the Periodic Table; and R1, R2, R3, and R4 are each independently H or C1-C8 alkyl.
Claims22
A compound having formula (I):
- wherein
- M is a metal selected from Groups 2 to 12 of the Periodic Table;
- and
- R1, R2, R3, and R4 are each independently H or C1-C8 alkyl.
1 more element
A method for forming a metal-containing film, the method comprising contacting a compound having formula I with an activating agent to form the metal-containing film:
- wherein
- M is a metal selected from Groups 2 to 12 of the Periodic Table;
- and
- R1, R2, R3, and R4 are each independently H or C1-C8 alkyl.
1 more element
A method of forming a metal film on a substrate, the method comprising a deposition cycle including:
- a) contacting a substrate with a vapor of a metal-containing compound described by formula I for a first predetermined pulse time to form a first modified surface:
- wherein:
- M is a metal selected from Groups 2 to 12 of the Periodic Table;
- and
- R1, R2, R3, and R4 are each independently H or C1-C8 alkyl;
- b) contacting the first modified surface with an acid for a second predetermined pulse time to form a second modified surface;
- and
- c) contacting the second modified surface with an activating agent for a third predetermined pulse time to form a metal layer.
5 more elements
Dependencies are inferred from the claim text.