Device and method for coating of a carrier wafer
AssigneeEV Group E. Thallner GmbH
InventorJürgen Burggraf
Life of this patent
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Abstract
A device and corresponding method for coating of an inner circular surface of a coating surface of a carrier wafer with a coating material. The device includes an application means for applying a coating material intended for coating of the inner circular surface to the inner circular surface, a rotating means for accommodating and rotating the carrier wafer around an axis of rotation and for distribution of the coating material on the coating surface, and a second application means for applying a coating inhibitor to an outer circular ring surface which surrounds the inner circular surface, said coating inhibitor at least inhibits the coating of the outer circular ring surface during the distribution of the coating material.
Claims14
A device for coating of an inner circular surface of a coating surface of a carrier wafer with a coating material being an antiadhesion material, said device comprising:
- an application means for applying the coating material to the inner circular surface, said coating material intended for coating of the inner circular surface
- a rotating means for accommodating and rotating the carrier wafer around a rotation axis of rotation and for distribution of the coating material on the coating surface, and
- a second application means having controlling means for applying a coating inhibitor to an outer circular ring surface which surrounds the inner circular surface, said coating inhibitor at least inhibits the coating of the outer circular ring surface during the distribution of the coating material.
A method for coating of an inner circular surface of a coating surface of a carrier wafer with a coating material being an antiadhesion material, said method comprising:
- application of the coating material to the inner circular surface by a first application means, and
- distribution of the coating material by rotating the carrier wafer around the axis of rotation by rotating means,
- wherein during the distribution of the coating material, a second application means supplies a coating inhibitor to an outer circular ring surface which surrounds the inner circular surface, said coating inhibitor at least inhibits the coating of the outer circular ring surface.
Dependencies are inferred from the claim text.