LaNiO3 THIN FILM-FORMING COMPOSITION AND METHOD OF FORMING LaNiO3 THIN FILM USING THE SAME
AssigneeMitsubishi Materials Corporation
InventorsJun Fujii, Hideaki Sakurai, Nobuyuki Soyama
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AssigneeMitsubishi Materials Corporation
InventorsJun Fujii, Hideaki Sakurai, Nobuyuki Soyama
Estimating the term…
A LaNiO3 thin film having extremely few voids is uniformly formed. Provided is a LaNiO3 thin film-forming composition for forming a LaNiO3 thin film. It includes: a LaNiO3 precursor; a first organic solvent; a stabilizer; and a second organic solvent. The first organic solvent includes carboxylic acids, alcohols, esters, ketones, ethers, cycloalkanes, aromatic compounds, or tetrahydrofuran. The stabilizer includes β-diketones, β-ketones, β-keto esters, oxyacids, diols, triols, carboxylic acids, alkanolamines, or polyvalent amines. The second organic solvent has a boiling point of 150° C. to 300° C. and a surface tension of 20 to 50 dyn/cm. The LaNiO3 precursor content is 1 to 20 mass % with respect to 100 mass % of the composition. The stabilizer content is 0 to 10 mol with respect to 1 mol of a total amount of the LaNiO3 precursors. The second organic solvent content is 5 to 20 mass % with respect to the composition.
A LaNiO3 thin film-forming composition for forming a LaNiO3 thin film, the composition comprising:
Dependencies are inferred from the claim text.