Polishing pad
AssigneeToyo Tire & Rubber Co., Ltd.
InventorTsuyoshi Kimura
Life of this patent
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Abstract
An object of the invention is to provide a polishing pad that is prevented from slurry leaks and has high optical detection accuracy. The present invention relates to a polishing pad comprising a polishing region, a cushion layer, and a support film layered in this order, wherein a light-transmitting region is provided on the support film and in an opening part that passes through the polishing region and the cushion layer; the light-transmitting region has a peripheral part and a recessed part on the surface of a polishing platen-side; the support film is layered on the peripheral part; and the support film is not layered on the recessed part, which remains open.
Claims6
A polishing pad comprising a polishing region, a cushion layer, and a support film layered in this order, wherein
- a light-transmitting region is provided on the support film and in an opening part that passes through the polishing region and the cushion layer;
- the light-transmitting region has a peripheral part and a recessed part on the surface of a polishing platen-side;
- the support film is layered on the peripheral part;
- and
- the support film is not layered on the recessed part, which remains open.
Dependencies are inferred from the claim text.