Process for producing a semiconductor chip
AssigneeCanon Kabushiki Kaisha
InventorsKenji Fujii, Mitsuru Chida, Makoto Watanabe, Toshiaki Kurosu, Masataka Nagai, Takanobu Manabe
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AssigneeCanon Kabushiki Kaisha
InventorsKenji Fujii, Mitsuru Chida, Makoto Watanabe, Toshiaki Kurosu, Masataka Nagai, Takanobu Manabe
Estimating the term…
A process for producing a semiconductor chip having a substrate and a bump formed on the substrate including (1) forming, on a substrate, a conductor gold for plating to be a base of plating growth; (2) forming a mask for plating on the conductor gold for plating; (3) performing plating using the mask for plating to form the bump and a dummy pattern; (4) removing the mask for plating; (5) etching the conductor gold for plating; and (6) applying a shock to at least the dummy pattern. The amount of side etching of the conductor gold for plating is grasped from a state of separation of the dummy pattern due to the shock in the step (6).
A process for producing a semiconductor chip including a substrate and a bump formed on the substrate, the process comprising:
Dependencies are inferred from the claim text.