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US 2014/0212818 A1Published application
Method for forming graphene pattern
AssigneeSamsung Display Co., Ltd.
InventorsSung-Ku Kang, Byeong-Kyu Jeon, Jung-Yun Kim
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Abstract
There is provided a method for forming a graphene pattern, in which a graphene thin film layer is transferred onto a surface of a photosensitive film, and then patterned through exposure/development of the photosensitive film. The photosensitive film is cured after being finally developed, thereby securing stability and reliability.
Claims10
A method for forming a graphene pattern, comprising:
- transferring a graphene thin film layer onto a surface of a photosensitive film;
- transferring and attaching, to a substrate, the photosensitive film having the graphene thin film layer formed on the surface thereof;
- and
- placing a mask having a predetermined pattern implemented therein above the graphene thin film layer, and patterning the graphene thin film layer through a photolithography process.
1 more element
Dependencies are inferred from the claim text.