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US 2014/0212816 A1Published application
Photolithographic methods
AssigneeRohm and Haas Electronic Materials LLC
InventorsYoung Cheol BAE, Rosemary BELL, Jong Keun PARK, Seung-Hyun LEE
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Abstract
Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
Claims10
A method of forming an electronic device, comprising:
- (a) providing a semiconductor substrate comprising one or more layers to be patterned;
- (b) forming a photoresist layer over the one or more layers to be patterned;
- (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises a basic quencher, a polymer and an organic solvent;
- (d) exposing the layer to actinic radiation;
- and
- (e) developing the exposed film with an organic solvent developer.
3 more elements
Dependencies are inferred from the claim text.