Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic device

An actinic-ray- or radiation-sensitive resin composition comprising any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer,

• in which
• each of R1 and R2 independently represents an aryl group, provided that R1 and R2 may be connected to each other;
• each of R3 and R4 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group or an aryl group, provided that R3 and R4 may be connected to each other;
• R5 represents an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an aralkyl group or an alkylcarbonyl group, provided that R5 may be connected to R3 or R4;
• and
• X− represents a nonnucleophilic anion.