Fluorine-based resins and photosensitive resin composition comprising the same

A fluorine-based resin comprising:

• 1) a repeating unit represented by the following Formula 1,
• 2) a repeating unit represented by the following Formula 2,
• 3) a repeating unit represented by the following Formula 3, and
• 4) one or more kinds of repeating units represented by the following Formula 4, Formula 5 and Formula 6,
• wherein
• R1, R2, R3, R4, R6, R7, R8, R9, R12 and R13 are the same as or different from each other, and each independently hydrogen or a C1-C5 alkyl group,
• R5 is a C1-C18 alkyl group,
• R10 is a phenyl group, a phenyl group substituted by halogen, or a phenyl group substituted by a C1-C3 alkyl group,
• R11 is a phenyl group, a phenyl group substituted by halogen, or a phenyl group substituted by a C1-C3 alkyl group,
• R14 is a C1-C6 alkyl group substituted by a phenyl group, a phenyl group substituted by a C1-C6 alkyl group, a phenyl group substituted by a C1-C6 alkoxy group, or a C1-C6 alkoxymethyl group, and
• a, b, c, d, e and f are a mole mixing ratio, a is 5 to 30, b is 5 to 30, c is 10 to 60, d is 0 to 20, e is 0 to 20, and f is 0 to 70.