Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

A pattern-forming method, comprising in this order:

• step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (C) a resin having one or more groups selected from the group consisting of a fluorine atom, a group having a fluorine atom, a group having a silicon atom, an alkyl group having 6 or more carbon atoms, a cycloalkyl group having 6 or more carbon atoms, an aryl group having 9 or more carbon atoms, an aralkyl group having 10 or more carbon atoms, an aromatic ring group substituted with at least one alkyl group having 3 or more carbon atoms and an aromatic ring group substituted with at least one cycloalkyl group having 5 or more carbon atoms and (D) a solvent;
• step (2) of exposing the film with an electron beam or extreme ultraviolet radiation;
• and
• step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.