Patterning process and resist composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKenji Funatsu, Kentaro Kumaki, Akihiro Seki, Tomohiro Kobayashi, Koji Hasegawa
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Abstract
A resist composition comprising a polymer comprising recurring units having an acid labile group of cyclopentyl with tert-butyl or tert-amyl pendant is coated onto a substrate, baked, exposed to high-energy radiation, PEB and developed in an organic solvent to form a negative pattern. A fine hole pattern can be formed from the resist composition with advantages including high dissolution contrast, good size control and wide depth of focus.
Claims15
A pattern forming process comprising the steps of:
- applying a resist composition comprising a polymer and an optional acid generator onto a substrate, said polymer comprising recurring units (a1) having an acid labile group of formula (1a), represented by the general formula (1):
- wherein R1 is hydrogen or methyl, and the broken line designates a valence bond,
- prebaking the composition to form a resist film,
- exposing a selected region of the resist film to high-energy radiation, baking, and
- developing the exposed film in an organic solvent-based developer to form a negative pattern wherein the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved.
A negative pattern-forming resist composition comprising a polymer, an optional acid generator, and an organic solvent,
- said polymer comprising recurring units (a1) having an acid labile group of formula (1a), represented by the general formula (1):
- wherein R1 is hydrogen or methyl, and the broken line designates a valence bond,
- said polymer being dissolvable in a developer selected from the group consisting of 2-octanone, 2-nonanone, 2-heptanone, 3-heptanone, 4-heptanone, 2-hexanone, 3-hexanone, diisobutyl ketone, methylcyclohexanone, acetophenone, methylacetophenone, propyl acetate, butyl acetate, isobutyl acetate, amyl acetate, isoamyl acetate, butenyl acetate, propyl formate, butyl formate, isobutyl formate, amyl formate, isoamyl formate, methyl valerate, methyl pentenoate, methyl crotonate, ethyl crotonate, methyl propionate, ethyl propionate, ethyl 3-ethoxypropionate, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, isobutyl lactate, amyl lactate, isoamyl lactate, methyl 2-hydroxyisobutyrate, ethyl 2-hydroxyisobutyrate, methyl benzoate, ethyl benzoate, phenyl acetate, benzyl acetate, methyl phenylacetate, benzyl formate, phenylethyl formate, methyl 3-phenylpropionate, benzyl propionate, ethyl phenylacetate, and 2-phenylethyl acetate.
Dependencies are inferred from the claim text.