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US 2014/0212797 A1Published application
Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, manufacturing method of semiconductor device, semiconductor device and production method of resin
AssigneeFUJIFILM Corporation
InventorsTakeshi KAWABATA, Hideaki TSUBAKI
Life of this patent
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Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes: (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I) as defined in the specification, wherein a polydispersity of the resin (P) is 1.20 or less.
Claims14
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
- (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I), wherein a polydispersity of the resin (P) is 1.20 or less:
- wherein in formula (1), each of R11, R12 and R13 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, R12 may combine with Ar1 to form a ring, and in this case, R12 represents an alkylene group;
- X1 represents a single bond, —COO— or —CONR14—, and R14 represents a hydrogen atom or an alkyl group;
- L1 represents a single bond or an alkylene group;
- Ar1 represents an (n+1)-valent aromatic ring group, provided that when Ar1 combines with R12, Ar1 represents an (n+2)-valent aromatic ring group;
- and
- n represents an integer of 1 or more.
4 more elements
A production method of (P) a resin, comprising:
- synthesizing (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I) and has a polydispersity of 1.20 or less, from poly(hydroxystyrene)s:
- wherein in formula (I), each of R11, R12 and R13 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, R12 may combine with Ar1 to form a ring, and in this case, R12 represents an alkylene group,
- X1 represents a single bond, —COO— or —CONR14—, and R14 represents a hydrogen atom or an alkyl group;
- L1 represents a single bond or an alkylene group;
- Ar1 represents an (n+1)-valent aromatic ring group, provided that when Ar1 combines with R12, Ar1 represents an (n+2)-valent aromatic ring group;
- and
- n represents an integer of 1 or more.
4 more elements
Dependencies are inferred from the claim text.