Deposition source with adjustable electrode
AssigneeApplied Materials, Inc.
InventorsWolfgang BUSCHBECK, Florian RIES, Tobias STOLLEY
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Abstract
An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate through a vacuum processing region, a plasma deposition source for depositing the thin film on the substrate in the vacuum processing region, wherein the plasma deposition source comprises an electrode, and an actuator configured for adjusting the distance between the electrode and the outer surface.
Claims20
An apparatus for depositing a thin film on a substrate, comprising:
- a substrate support having an outer surface for guiding the substrate through a vacuum processing region;
- a plasma deposition source for depositing the thin film on the substrate in the vacuum processing region, wherein the plasma deposition source comprises an electrode;
- and
- an actuator configured for adjusting the distance between the electrode and the outer surface.
A method of depositing a thin film on a substrate in a deposition apparatus, comprising:
- guiding a substrate over a substrate support;
- and
- varying the distance of an electrode of a plasma deposition source from the substrate support.
The method of claim 19, wherein the distance is varied by an actuator.
Dependencies are inferred from the claim text.