Magnetic field fluctuation for beam smoothing
AssigneeAdvanced Ion Beam Technology, Inc.
InventorsXiao BAI, Zhimin WAN, Donald Wayne BERRIAN
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AssigneeAdvanced Ion Beam Technology, Inc.
InventorsXiao BAI, Zhimin WAN, Donald Wayne BERRIAN
Estimating the term…
The time-averaged ion beam profile of an ion beam for implanting ions on a work piece may be smoothed to reduce noise, spikes, peaks, and the like and to improve dosage uniformity. Auxiliary magnetic field devices, such as electromagnets, may be located along an ion beam path and may be driven by periodic signals to generate a fluctuating magnetic field to smooth the ion beam profile (i.e., beam current density profile). The auxiliary magnetic field devices may be positioned outside the width and height of the ion beam, and may generate a non-uniform fluctuating magnetic field that may be strongest near the center of the ion beam where the highest concentration of ions may be positioned. The fluctuating magnetic field may cause the beam profile shape to change continuously, thereby averaging out noise over time.
A method for implanting ions in a work piece using an ion implantation tool, the ion implantation tool having an ion beam source, a mass analyzing magnet, a plurality of separately driven electromagnets, and one or more separately driven auxiliary electromagnets, the method comprising:
A system for implanting ions in a work piece, the system comprising:
A non-transitory computer-readable storage medium containing computer executable instructions for implanting a work piece with ions using an ion implantation tool, the ion implantation tool having an ion beam source, a mass analyzing magnet, a plurality of separately driven electromagnets, and one or more separately driven auxiliary electromagnets, the computer executable instructions comprising instructions for:
A method of shaping an ion beam, the method comprising:
A system for shaping an ion beam, the system comprising:
Dependencies are inferred from the claim text.