Method and device for continuously coating substrates
AssigneeFraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
InventorsStefan Reber, Norbert Schillinger, David Pocza, Martin Arnold
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Abstract
The invention relates to a method for continuous coating of substrates, in which the substrates are transported continuously through a deposition chamber and, at the same time, measures are adopted for reducing parasitic deposits as well as possible. Likewise, the invention relates to a corresponding device for continuous coating of substrates.
Claims19
A method for continuous coating of substrates in which, in a coating device, the substrates are transported through a deposition chamber which is delimited by two substrate carriers and also a base and a cover, the base having a device for guiding the substrate carriers, the substrates on the substrate carriers being transported through the coating device, the continuous coating of the substrates being effected during the transport and the cover being fixed to the substrate carriers and thus being transported together with the substrate carriers through the coating device.
A device for continuous coating of substrates having a deposition chamber which is provided for the chemical vapour deposition and is delimited by two substrate carriers and also a base and a cover, the base having a device for guiding the substrate carriers, and the cover being fixed to the substrate carriers and thus being able to be transported together with the substrate carriers through the coating device, in that the cover and the substrate carriers together with the substrate can be transported out of the deposition chamber.
Dependencies are inferred from the claim text.