Fabrication of High-Throughput Nano-Imprint Lithography Templates

An imprint lithography template comprising:

• a first layer;
• a second layer, wherein the second layer is a patterned layer of an imprint lithography template;
• and
• two or more intermediate layers positioned between the first layer and the second layer, wherein at least one of the intermediate layers is a porous layer and at least one of the intermediate layers is a stress relief layer configured to reduce a force acting on the porous intermediate layer.

An imprint lithography template comprising:

• a first layer;
• a second layer, wherein the second layer is a patterned layer of an imprint lithography template;
• and
• an intermediate layer positioned between the first layer and the second layer, wherein the intermediate layer is configured to reduce a force acting on the patterned second layer.

An imprint lithography template comprising:

• a first layer;
• a second layer;
• and
• an intermediate layer positioned between the first layer and the second layer of the imprint lithography template, wherein the intermediate layer is configured to allow assessment of a thickness of the second layer based on a difference in physical properties between the intermediate layer and the second layer.