Back to results
US 2014/0212104 A1Published application
Athermal waveguide and method of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsSeong-ho CHO, Rakib Uddin MOHAMMAD
Life of this patent
Estimating the term…
Abstract
Provided are an athermal waveguide and a method of manufacturing the same. The athermal waveguide includes: a substrate having a protruded region; a first material layer formed on the protruded region to counteract thermal expansion; and a second material layer formed on the first material layer a position corresponding to the protruded region and formed of a same base material as the protruded region.
Claims20
An athermal waveguide comprising:
- a substrate having a protruded region;
- a first material layer formed on the protruded region, the first material layer configured to counteract thermal expansion;
- and
- a second material layer formed on the first material layer at a position corresponding to the protruded region and formed of a same base material as the protruded region.
1 more element
A method of manufacturing an athermal waveguide, the method comprising:
- etching a substrate such that a protruded region is formed;
- forming a first material layer configured to counteract thermal expansion, on the protruded region;
- and
- forming a second material layer on the first material layer by using a same base material as the protruded region, at a position corresponding to the protruded region.
1 more element
Dependencies are inferred from the claim text.