Electrical Connector, Electrical Connection System and Lithographic Apparatus
AssigneeASML Netherlands B.V.
InventorsAlexander Petrus HILBERS, Ronald Van Der Wilk
Life of this patent
Estimating the term…
Abstract
An electrical connector comprises a high voltage pad and a high voltage plate. When connected to another electrical connector, the two plates, which are at the same voltage as the pads, form a region of high voltage in which the field is low. The pads are positioned in that region. An electrostatic clamp of an EUV lithographic apparatus may have such a pad and plate, for connecting to the electrical connector. By placing the interconnection in a low field region, triple points (points of contact between a conductor, a solid insulator and a gas) may be present in that region.
Claims21
An electrical connection system comprising:
- an electrical connector comprising:
- an outer shield layer,
- an outer insulating layer,
- a first high voltage plate,
- an inner insulating layer, and
- a first high voltage pad, wherein the first high voltage pad is smaller than the first high voltage plate and lies substantially wholly within the first high voltage plate when viewed in a first direction perpendicular to a first plane of the first high voltage plate;
- and
- an electrostatic clamp comprising:
- a second high voltage pad configured to electrically connect to a component external to the electrostatic clamp;
- and
- a second high voltage plate substantially parallel to the second high voltage pad,
- wherein the second high voltage pad is smaller than the second high voltage plate and lies substantially wholly within the second high voltage plate when viewed in a second direction perpendicular to a second plane of the second high voltage plate, and
- wherein the first high voltage pad is in electrical contact with the second high voltage pad.
A lithographic apparatus comprising:
- a patterning device support configured to support a patterning device, the patterning device being configured to impart a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate support configured to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate;
- a high voltage electrical connector comprising:
- a first high voltage plate, and
- a first high voltage pad, wherein the first high voltage plate is configured to form a region of equipotential that encompasses the first high voltage pad positioned within the region of equipotential to reduce electrical breakdown;
- a high voltage electrostatic clamp configured to clamp the patterning device to the patterning device support or to clamp the substrate to the substrate support, the high voltage electrostatic clamp comprising:
- a second high voltage pad configured to electrically connect to a component external to the electrostatic clamp;
- and
- a second high voltage plate substantially parallel to the second high voltage pad,
- wherein the second high voltage pad is in electrical contact with the first high voltage pad.
A high voltage electrical connection system comprising:
- an electrical connector comprising:
- a first high voltage plate, and
- a first high voltage pad, wherein the first high voltage plate is configured to form a substantially equipotential region that encompasses the first high voltage pad positioned within the substantially equipotential region to reduce electrical breakdown;
- and
- an electrical component comprising:
- a second high voltage pad configured to electrically connect to a component external to the electrical component;
- and
- a second high voltage plate substantially parallel to the second high voltage pad,
- wherein the second high voltage pad is smaller than the second high voltage plate and lies substantially wholly within the second high voltage plate when viewed in a direction perpendicular to a plane of the second high voltage plate, and
- wherein the first high voltage pad is in electrical contact with the second high voltage pad.
Dependencies are inferred from the claim text.