Microlithographic projection exposure apparatus

An apparatus, comprising:

• illumination optics configured to illuminate object field points of an object field in an object plane;
• and
• projection optics configured to image the object field on an image field in an image plane,
• wherein:
• the illumination optics have, for each object field point of the object field, an exit pupil associated with the object point;
• the illumination optics comprise a multi-mirror array comprising a plurality of mirrors configured to adjust an intensity distribution in exit pupils associated to the object field points;
• the illumination optics comprise an optical system configured to temporally stabilise the illumination of the multi-mirror array by superposing the illumination rays of the illumination ray bundle on the multi-mirror array;
• the optical system is configured for spatially homogeneous illumination of the multi-mirror array;
• and
• the apparatus is a microlithography projection exposure apparatus.

An apparatus, comprising:

• illumination optics configured to illuminate object field points of an object field in an object plane, the illumination optics comprising:
• a multi-mirror array comprising a plurality of mirrors;
• at least one optical system configured to temporally stabilise the illumination of the multi-mirror array, the at least one optical system comprising:
• a honeycomb condenser having a first honeycomb channel plate and a second honeycomb channel plate arranged in a focal plane of the first honeycomb channel plate, and an optical phase element arranged between the first and the second honeycomb channel plates;
• and
• projection optics configured to image the object field of the illumination optics on an image field in an image plane,
• wherein:
• the illumination optics have, for each object field point of the object field, an exit pupil associated with the object point;
• the multi-mirror array is configured to adjust an intensity distribution in exit pupils associated to the object field points;
• and
• the apparatus is a microlithography projection exposure apparatus.