Radiation Source
AssigneeASML Netherlands B.V.
InventorsChristian Wagner, Erik Roelof Loopstra
Life of this patent
Estimating the term…
Loading patent…
AssigneeASML Netherlands B.V.
InventorsChristian Wagner, Erik Roelof Loopstra
Estimating the term…
According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam back toward the beam splitter.
A radiation source comprising:
A laser comprising:
A method of generating laser radiation, the method comprising:
A radiation source comprising:
A laser comprising:
A lithographic apparatus comprising, being in connection with, or connectable to, a radiation source or laser comprising:
A method of generating laser radiation, the method comprising:
Dependencies are inferred from the claim text.