Exposure apparatus and device manufacturing method

An exposure method of exposing a substrate with an energy beam via a projection optical system and a liquid, the method comprising:

• forming an immersion area under the projection optical system with the liquid supplied via an immersion member such that the liquid is in contact with an optical member of the projection optical system, the immersion member being provided surrounding the optical member and having a lower surface, apart of the lower surface having an opening through which the energy beam is passed;
• arranging one of first and second movable members to be opposed to the immersion member, the first movable member having an upper surface that is arranged to contact the immersion area, a mount area for the substrate being provided in a hole that is formed in a part of the upper surface of the first movable member, the upper surface of the first movable member being configured to maintain at least a part of the immersion area which is arranged outside the substrate mounted on the mount area, the second movable member having an upper surface that is configured to maintain the immersion area;
• executing a relative movement between the first and second movable members such that, while one of the first and second movable members is arranged opposed to the immersion member, the other of the first and second movable members comes close to the one of the first and second movable members;
• and
• moving the close first and second movable members relative to the immersion member in a predetermined direction perpendicular to an optical axis of the projection optical system such that the other of the first and second movable members is arranged opposite to the immersion member in place of the one of the first and second movable members while substantially maintaining the immersion area under the projection optical system, wherein
• when the immersion area is maintained under the projection optical system by the one of the first and second movable members which is arranged opposed to the immersion member, the other of the first and second movable members is away from under the projection optical system, and
• the liquid of the immersion area is collected via the immersion member.

A manufacturing method of an exposure apparatus that is for exposing a substrate with an energy beam via a projection optical system and a liquid, the method comprising:

• providing an immersion member provided surrounding an optical member of the projection optical system and configured to form an immersion area under the projection optical system with the liquid such that the liquid is in contact with the optical member, the immersion member having a lower surface, apart of the lower surface having an opening through which the energy beam is passed;
• providing a first movable member having an upper surface that is arranged to contact the immersion area, a mount area for the substrate being provided in a hole that is formed in a part of the upper surface, the upper surface of the first movable member being configured to maintain at least a part of the immersion area which is arranged outside the substrate mounted on the mount area;
• providing a second movable member having an upper surface that is configured to maintain the immersion area, the second movable member being arranged opposed to the immersion member when the first movable member is away from under the projection optical system;
• providing a drive system having a motor, parts of which are provided at the first and second movable members respectively, and configured to, with the motor, move the first and second movable members independently from each other;
• and
• providing a controller configured to control a movement of the first and second movable members by the drive system, wherein
• the controller is configured to control the first and second movable members so as to (i) execute a relative movement between the first and second movable members such that, while one of the first and second movable members is arranged opposed to the immersion member, the other of the first and second movable members comes close to the one of the first and second movable members, and so as to (ii) move the close first and second movable members relative to the immersion member in a predetermined direction perpendicular to an optical axis of the projection optical system such that the other of the first and second movable members is arranged opposite to the immersion member in place of the one of the first and second movable members while substantially maintaining the immersion area under the projection optical system,
• when the immersion area is maintained under the projection optical system by the one of the first and second movable members which is arranged opposed to the immersion member, the other of the first and second movable members is away from under the projection optical system,
• the immersion area is formed with the liquid which is supplied via the immersion member, and
• the liquid of the immersion area is collected via the immersion member.