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US 2014/0210345 A1Published application
Capacitively coupled remote plasma source
AssigneeAdvanced Energy Industries, Inc.
InventorDaniel J. Hoffman
Life of this patent
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Abstract
This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.
Claims1
A remote plasma source comprising:
- a first electrode;
- a second electrode, one of the first or second electrodes at least partially surrounding the other;
- a chamber at least partially enclosed by a chamber wall and configured for coupling to a processing chamber, the chamber wall separating the first and second electrodes, and the chamber including:
- a first path for the entry of a first fluid into the chamber;
- and
- a second path configured to provide a second fluid to the processing chamber,wherein the second fluid includes at least a portion of disassociated fluid created from the first fluid;
- and
- an RF power source input configured to couple to an RF power source and provide RF power from the RF power source to the first electrode, the RF power electrostatically coupling to the second electrode so as to electrostatically sustain a plasma within at least a portion of the chamber.
5 more elements
Dependencies are inferred from the claim text.