Antenna for plasma processing device, and plasma processing device using the same
AssigneeEmd Corporation
InventorsYuichi Setsuhara, Akinori Ebe
Life of this patent
Estimating the term…
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AssigneeEmd Corporation
InventorsYuichi Setsuhara, Akinori Ebe
Estimating the term…
A radio-frequency antenna includes a linear antenna conductor, a dielectric protective pipe provided around the antenna conductor, and a deposit shield provided around the protective pipe, the deposit shield covering at least one portion of the protective pipe and having at least one opening on any line extending along the length of the antenna conductor. Although the thin-film material adheres to the surfaces of the protective pipe and the deposit shield, the deposited substance has at least one discontinuous portion in the longitudinal direction of the antenna conductor. Therefore, in the case where the thin-film material is electrically conductive, the blocking of the radio-frequency induction electric field is prevented. In the case where the thin-film material is not electrically conductive, an attenuation in the intensity of the radio-frequency induction electric field is suppressed.
A radio-frequency antenna to be provided in a vacuum container, for passing a radio-frequency electric current so as to generate a radio-frequency induction electric field in the vacuum container and thereby turn a plasma generation gas introduced in the vacuum container into plasma, comprising:
A plasma processing device, comprising:
A plasma processing device, comprising:
A plasma processing device, comprising:
Dependencies are inferred from the claim text.