Nanoimprinting method and resist composition employed in the nanoimprinting method

A nanoimprinting method, comprising the steps of:

• employing a mold having a fine pattern of protrusions and recesses on a surface thereof;
• exposing a resist composition coated on a substrate to be processed while the resist composition is pressed with the pattern of protrusions and recesses, to cure the resist composition;
• and
• separating the mold from the resist composition;
• wherein:
• the resist composition includes polymerizable compounds and a polymerization initiating agent, each having absorption spectrum properties with absorption regions within a range from 250 nm to 500 nm;
• the polymerization initiating agent having an absorption region with a longer wavelength end wavelength longer than the longer wavelength end wavelength of the absorption region of the polymerizable compounds;
• and
• exposure of the resist composition being executed by light having spectral intensity properties that satisfy Formula 1 below:
• λb<λa≦λc (1)
• wherein λa is a set light emission wavelength related to spectral intensity properties within light within a wavelength range from 250 nm to 500 nm irradiated during the exposure, and represents a set light emission wavelength toward the shorter wavelength end at which the light emission intensity is 10% with respect to the light emission intensity at a maximum peak wavelength;
• λb is a set absorption wavelength related to the absorption spectrum properties of the polymerizable compounds, and represents a set absorption wavelength at the longer wavelength end at which light absorption is 10% with respect to light absorption at a maximum peak wavelength;
• and
• λc is a set absorption wavelength related to the absorption spectrum properties of the polymerization initiating agent, and represents a set absorption wavelength at the longer wavelength end at which light absorption is 10% with respect to light absorption at a maximum peak wavelength.