Array substrate, fabrication method thereof and display device

A display device comprising an array substrate, the array substrate comprises:

• a base substrate;
• a gate layer which is disposed on the base substrate and comprises a gate;
• a gate insulating layer disposed on the gate layer;
• a source layer which is disposed on the gate insulating layer and comprises a source;
• a metal oxide semiconductor layer which is disposed on the source layer and the gate insulating layer and comprises an active layer, wherein the source is in direct contact with the active layer;
• and
• a pixel electrode layer in direct contact with the active layer,
• wherein, a position where the gate is formed in the gate layer corresponds to a position between the source and a contacting portion of the pixel electrode layer with the active layer.

A fabrication method of an array substrate, comprising:

• forming a gate layer comprising a gate on a base substrate;
• forming a gate insulating layer on the gate layer;
• forming a source layer comprising a source on the gate insulating layer;
• and
• forming a metal oxide semiconductor layer and a pixel electrode layer, the metal oxide semiconductor layer comprising an active layer,
• wherein, the source and the pixel electrode layer are respectively in direct contact with the active layer, and a position where the gate is formed in the gate layer corresponds to a position between the source and a contacting portion of the pixel electrode layer with the active layer.