Memory Constructions
AssigneeMicron Technology, Inc.
InventorsAndrea Redaelli, Agostino Pirovano
Life of this patent
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Abstract
Some embodiments include memory constructions having a plurality of bands between top and bottom electrically conductive materials. The bands include chalcogenide bands alternating with non-chalcogenide bands. In some embodiments, there may be least two of the chalcogenide bands and at least one of the non-chalcogenide bands. In some embodiments, the memory cells may be between a pair of electrodes; with one of the electrodes being configured as a lance, angled plate, container or beam. In some embodiments, the memory cells may be electrically coupled with select devices, such as, for example, diodes, field effect transistors or bipolar junction transistors.
Claims21
A memory construction comprising at least one region having a pair of chalcogenide bands spaced apart from one another by a non-chalcogenide band;
- wherein the chalcogenide bands and the non-chalcogenide band have thicknesses less than about 5 nanometers.
A memory construction comprising a stack which includes a bottom electrically conductive material, a top electrically conductive material, and a plurality of bands between the top and bottom electrically conductive materials;
- the bands including chalcogenide bands alternating with non-chalcogenide bands;
- wherein there at least two of the chalcogenide bands and at least one of the non-chalcogenide bands.
20-31. (canceled)
Dependencies are inferred from the claim text.