Target supply device and euv light generation chamber
AssigneeGigaphoton Inc.
InventorHiroshi UMEDA
Life of this patent
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Abstract
A target supply device may include a tank including a nozzle, a first electrode disposed within the tank, a first potential setting unit configured to set a potential at the first electrode to a first potential, a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential, and a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region.
Claims8
A target supply device that supplies a target material to a plasma generation region, the device comprising:
- a tank including a nozzle;
- a first electrode disposed within the tank;
- a first potential setting unit configured to set a potential at the first electrode to a first potential;
- a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole;
- a second potential setting unit configured to set a potential at the second electrode to a second potential that is different from the first potential;
- and
- a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region.
An EUV light generation chamber for irradiating a target material supplied to a plasma generation region with a laser beam, the EUV light generation chamber comprising:
- a chamber including an introduction hole that introduces the laser beam;
- a tank, including a nozzle, that is anchored to the chamber so that the nozzle is positioned within the chamber;
- a first electrode disposed within the tank;
- a second electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole;
- and
- a charge neutralization unit configured to neutralize a charge of the target material that passes through a first region located between the second electrode and the plasma generation region.
Dependencies are inferred from the claim text.