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AssigneeFUJIFILM Corporation
InventorsKazuharu NAKAMURA, Satoshi WAKAMATSU
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A nanoimprinting mold includes: a mold main body having a fine pattern of protrusions and recesses on a surface thereof; and a mold release layer formed on the surface of the mold main body. The mold release layer is formed within a mold release layer forming region, which is a region of the mold main body that includes a patterned region where the fine pattern of protrusions and recesses is formed and has an outer edge positioned outside the outer edge of the patterned region. An outer peripheral mold release layer has a thickness distribution in which the thickness of the outer peripheral mold release layer is locally maximal at positions outside the outer edge of the patterned region, substantially continuously along the entire periphery. Thereby, it becomes possible to restrict the region in which resist flows during nanoimprinting, without employing a mesa type substrate.
A nanoimprinting mold, comprising:
A method for producing a nanoimprinting mold equipped with a mold main body having a fine pattern of protrusions and recesses on a surface thereof and a mold release layer formed on the surface, comprising:
A method for producing a nanoimprinting mold equipped with a mold main body having a fine pattern of protrusions and recesses on a surface thereof and a mold release layer formed on the surface, comprising:
Dependencies are inferred from the claim text.