Plasma Equipment and Method of Dry-Cleaning the Same
AssigneeSamsung Electronics Co., Ltd.
InventorsSe-Yeon Kim, Kyung Hwan Jeong
Life of this patent
Estimating the term…
Abstract
A plasma equipment includes a chamber, a shower head disposed in an upper part of an inner space of the chamber for discharging a cleaning gas into the chamber, a plasma generator for generating a plasma gas from the cleaning gas, a lower electrode disposed in a lower part of the inner space of the chamber, a chuck covering the lower electrode, and a field inducing unit disposed outside the chamber for inducing an electric field or a magnetic field within the chamber in a direction parallel to top surfaces of the chuck and the lower electrode. The field inducing unit concentrates the plasma gas on an inner sidewall of the chamber and protects the chuck from the plasma gas.
Claims18
A plasma equipment comprising:
- a chamber having an inner space;
- a shower head disposed in an upper part of the inner space of the chamber, the shower head configured to discharge a cleaning gas into the chamber;
- a plasma generator disposed in the inner space of the chamber, the plasma generator configured to generate a plasma gas from the cleaning gas;
- a lower electrode disposed in a lower part of the inner space of the chamber;
- a chuck on the lower electrode;
- and
- a field inducing unit disposed outside the chamber, the field inducing unit configured to induce an electric field or a magnetic field within the chamber in a direction parallel to top surfaces of the chuck and the lower electrode to concentrate the plasma gas on an inner sidewall of the chamber and to protect the chuck from the plasma gas.
13-15. (canceled)
A plasma equipment comprising:
- a chamber including an inner chamber and an outer chamber, the inner chamber having an inner space, the outer chamber surrounding the inner chamber;
- a shower head disposed in an upper part of the inner space of the inner chamber, the shower head configured to discharge a cleaning gas into the inner chamber;
- a plasma generator disposed in the inner space of the inner chamber, the plasma generator configured to generate a plasma gas from the cleaning gas;
- a lower electrode disposed in a lower part of the inner space of the inner chamber;
- a chuck on the lower electrode;
- and
- a field inducing unit disposed outside the inner chamber, the field inducing unit configured to induce an electric field and/or a magnetic field within the inner chamber in a direction parallel to top surfaces of the chuck and the lower electrode to concentrate the plasma gas on an inner sidewall of the inner chamber and to protect the chuck from the plasma gas;
- wherein the inner chamber and the field inducing unit are movable relative to one another such that the plasma gas is concentrated on different areas of the inner sidewall of the inner chamber.
Dependencies are inferred from the claim text.