Showerhead having a detachable gas distribution plate
AssigneeApplied Materials, Inc.
InventorsDMITRY LUBOMIRSKY, VLADIMIR KNYAZIK, HAMID NOORBAKHSH, JASON DELLA ROSA, ZHENG JOHN YE, JENNIFER Y. SUN, SUMANTH BANDA
Life of this patent
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Abstract
Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side; a gas distribution plate disposed proximate the second side of the base; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed between the base and gas distribution plate.
Claims20
A showerhead for use in a semiconductor processing chamber, comprising:
- a base having a first side and an opposing second side;
- a gas distribution plate disposed proximate the second side of the base;
- a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base;
- and
- a thermal gasket disposed between the base and gas distribution plate.
A process chamber, comprising:
- a chamber body having a substrate support disposed within an inner volume of the chamber body;
- and
- a showerhead disposed within the inner volume of the chamber body opposite the substrate support, the showerhead comprising:
- a base having a first side and an opposing second side, wherein the first side of the base is coupled to a component of the process chamber;
- a gas distribution plate disposed proximate the second side of the base;
- a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base;
- and
- a thermal gasket disposed between the base and gas distribution plate.
Dependencies are inferred from the claim text.