Gas separation membrane, method of producing the same, and gas separating membrane module using the same
AssigneeFUJIFILM Corporation
InventorsKenichi ISHIZUKA, Shigehide ITOU
Life of this patent
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Abstract
A gas separation membrane, containing: a support; and a separating layer formed on the support, the separating layer containing a resin; the separating layer containing, at the side thereof opposite to the support, a hydrophilic modification treatment surface, the hydrophilic modification treatment surface involved in a layer having a film thickness of 0.1 μm or less, and the hydrophilic modification treatment surface provided with a surface contact angle measured by using water thereon in the range of 60 degrees or less.
Claims9
A gas separation membrane, comprising:
- a support;
- and
- a separating layer formed on the support, the separating layer containing a resin;
- the separating layer comprising, at the side thereof opposite to the support, a hydrophilic modification treatment surface, the hydrophilic modification treatment surface involved in a layer having a film thickness of 0.1 μm or less, and the hydrophilic modification treatment surface provided with a surface contact angle measured by using water thereon in the range of 60 degrees or less.
A method of producing a gas separation membrane containing a support and a separating layer formed on the support, comprising the steps of:
- forming a separating layer over the support;
- and
- applying any treatment below to the separating layer to form a hydrophilic modification treatment surface:
- (i) plasma treatment, electron beam irradiation treatment, ultraviolet light irradiation treatment, ultraviolet light-ozone irradiation treatment, or corona discharge treatment;
- (ii) hydrophilic silane coupling agent treatment performed after the treatment of (i);
- (iii) vapor deposition or sputtering treatment by metal oxide;
- and
- (iv) chemical etching treatment.
Dependencies are inferred from the claim text.