# US 2014/0197559 A1 · Mold, mold manufacturing method and method for manufacturing anti-reflection film using the mold

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- Number: US 2014/0197559 A1
- Document ID: US20140197559A1
- Status: Published application
- Kind: A1
- Application number: 14/212,636
- Filed: 2014-03-14
- Published: 2014-07-17
- Earliest claimed: 2009-01-30
- Assignees: Sharp Kabushiki Kaisha
- Applicants: Sharp Kabushiki Kaisha
- Inventors: Akinobu ISURUGI; Kiyoshi MINOURA
- Web page: https://patentgrep.com/patent/US20140197559A1

## CPC

- G02B 1/118: having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
- B29C 33/3828: {Moulds made of at least two different materials having different thermal conductivities}
- B29C 33/424: {Moulding surfaces provided with means for marking or patterning (for injection moulding B29C45/372)}
- B29C 33/62: based on polymers or oligomers
- B29C 35/0805: {using electromagnetic radiation}
- C25D 11/045: {for forming AAO templates}
- C25D 11/06: characterised by the electrolytes used
- C25D 11/12: Anodising more than once, e.g. in different baths
- C25D 11/24: Chemical after-treatment
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- C25D: PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR

## Abstract

A mold of at least one embodiment of the present invention includes: a base; a conductive layer provided on the base; and an anodized film provided on the conductive layer, the anodized film having an inverted motheye structure in its surface, the inverted motheye structure having a plurality of recessed portions whose two-dimensional size viewed in a direction normal to the surface is not less than 10 nm and less than 500 nm, wherein the base, the conductive layer, and the anodized film are capable of transmitting ultraviolet light.

## Claims

### Claim at position 1

1-6. (canceled)

### Claim 7

A method of fabricating a mold that has an inverted motheye structure in its surface, the inverted motheye structure having a plurality of recessed portions whose two-dimensional size viewed in a direction normal to the surface is not less than 10 nm and less than 500 nm, the method comprising the steps of:
(a) providing a base which is capable of transmitting ultraviolet light;
(b) forming on the base a conductive layer which is capable of transmitting ultraviolet light;
(c) depositing an aluminum film on the conductive layer; and
(d) anodizing an entirety of the aluminum film, step (d) including
(d1) anodizing the aluminum film to form a porous alumina layer which has a plurality of very small recessed portions,
(d2) after step (d1), bringing the porous alumina layer into contact with an etchant, thereby enlarging the plurality of very small recessed portions of the porous alumina layer, and
(d3) after step (d2), further anodizing the aluminum film to grow the plurality of very small recessed portions.

### Claim 8 (depends on 7)

The method of claim 7, wherein step (d) includes, after step (d3), further performing step (d2) and step (d3).

### Claim 9 (depends on 7)

The method of claim 7, wherein step (d) further includes
(da) forming the inverted motheye structure in a surface of the porous alumina layer through steps (d1) to (d3), and
(db1) after step (da), further anodizing the aluminum film to form minute pores on a side of the porous alumina layer which is closer to the conductive layer, the minute pores being smaller than the plurality of recessed portions.

### Claim 10 (depends on 9)

The method of claim 9, further comprising
(db2) after step (db1), anodizing the aluminum film to form an alumina layer which does not have the minute pores on a side of the porous alumina layer which is closer to the conductive layer.

### Claim 11 (depends on 10)

The method of claim 10, wherein the step (db2) is performed in an electrolytic solution whose pH is more than 4.0 and not more than 7.0.

### Claim 12 (depends on 11)

The method of claim 11, wherein the electrolytic solution used in step (db2) is an aqueous solution which contains at least one of acids or salts selected from a group consisting of tartaric acid, ammonium tartrate, potassium sodium tartrate, boric acid, ammonium borate, ammonium oxalate, ammonium citrate, maleic acid, malonic acid, phthalic acid, and citric acid.

### Claim 13 (depends on 10)

The method of claim 10, wherein step (db2) is performed in an acidic aqueous solution with a concentration of not more than 0.1 mol/L.

### Claim 14 (depends on 7)

A method of fabricating an antireflection film, comprising:
providing the mold as set forth in claim 7 and a work; and
irradiating a UV-curable resin provided between the mold and a surface of the work with ultraviolet light supplied through the mold, thereby curing the UV-curable resin.

### Claim 15 (depends on 10)

The method of claim 10, wherein the thickness of the alumina layer which does not have the minute pores after the step (db2) is more than the thickness of an alumina layer which does not have the minute pores after the step (db1).

### Claim 16 (depends on 10)

The method of claim 10, wherein the step (db2) comprises:
filling the minute pores.

### Claim 17 (depends on 9)

The method of claim 9, wherein the step (db1) comprises:
anodizing the aluminum film until substantially the entire mold becomes transparent.