# US 2014/0197350 A1 · Method for producing a low-emissivity system > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0197350 A1 - Document ID: US20140197350A1 - Status: Published application - Kind: A1 - Application number: 14/238,742 - Filed: 2012-08-20 - Published: 2014-07-17 - Earliest claimed: 2011-08-19 - Assignees: VON ARDENNE GmbH - Inventors: Joerg Neidhardt; Christoph Koeckert - Web page: https://patentgrep.com/patent/US20140197350A1 ## CPC - E04B 1/78: Heat insulating elements {(E04B1/7662 takes precedence)} - C03C 17/06: with metals (C03C17/34, C03C17/44 take precedence) - C03C 17/36: at least one coating being a metal - C03C 17/366: {Low-emissivity or solar control coatings} - C03C 23/001: {by infrared light} - C03C 23/0015: {by visible light} - C03C 23/0025: {by a laser beam} - C23C 14/14: Metallic material, boron or silicon - C23C 14/5806: {Thermal treatment} - C03C 2218/32: After-treatment - E04B: GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS (border constructions of opening in walls, floors or ceilings E06B1/00; {electromagnetic shielding H05K9/0001}) - C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A method for producing a low-emissivity layer system on at least one side of the substrate includes the steps of providing the substrate, forming at least one low-emissivity layer on at least one side of the substrate by a deposition process and briefly tempering at least one deposited layer. The electromagnetic radiation used for briefly tempering a low-emissivity layer is adjusted in such a manner that the tempered layer has layer properties comparable to those of a conventionally heat-treated low-emissivity layer of a safety glass. ## Claims ### Claim 1 A method for producing a low-emissivity layer system on at least one side of a substrate, comprising the steps of providing the substrate, forming at least one transparent metallic IR reflection layer of the low-emissivity layer system on at least one side of the substrate by deposition, subsequently briefly tempering at least one deposited layer by electromagnetic radiation while avoiding immediate heating of the entire substrate, wherein the at least one transparent metallic IR reflection layer is briefly tempered, wherein the electromagnetic radiation for brief tempering is set in such a way that sheet resistance and thus absorption in an infrared spectral range and/or a transmission in a visible spectral range and/or spectral reflection of the low-emissivity layer system are set to values such as those of a conventionally heat-treated low-emissivity layer system of a safety glass. ### Claim 2 (depends on 1) The method as claimed in claim 1, wherein the step of briefly tempering the transparent metallic IR reflection layer by electromagnetic radiation is carried out at an emission wavelength of the electromagnetic radiation at which the electromagnetic radiation is at least partly absorbed by the deposited transparent metallic IR reflection layer. ### Claim 3 (depends on 1) The method as claimed in claim 1, wherein the step of briefly tempering the transparent metallic IR reflection layer is carried out at an emission wavelength of the electromagnetic radiation in the range of 250 nm to less than 500 nm and/or in the range of greater than 500 to 1000 nm. ### Claim 4 (depends on 1) The method as claimed in claim 1 wherein the electromagnetic radiation for brief tempering is set in such a way that the transparent metallic IR reflection layer receives a predefinable energy input in the irradiation region. ### Claim 5 (depends on 1) The method as claimed in claim 1, wherein the electromagnetic radiation for brief tempering is set in such a way that it has a linear intensity distribution perpendicular to the transport direction of the substrate. ### Claim 6 (depends on 1) The method as claimed in claim 1, wherein length of a linear intensity distribution of the electromagnetic radiation for brief tempering corresponds at least to a width of the transparent metallic IR reflection layer deposited on the substrate in a direction of a longitudinal extent of the linear intensity distribution of the electromagnetic radiation. ### Claim 7 (depends on 6) The method as claimed in claim 6, wherein both the length and power density of the linear intensity distribution of the electromagnetic radiation for brief tempering are variable. ### Claim 8 (depends on 1) The method as claimed in claim 1, wherein the electromagnetic irradiation of the low-emissivity layer is carried out by one or more lasers. ### Claim 9 (depends on 8) The method as claimed in claim 8, wherein energy input received by the low-emissivity layer in the irradiation region is regulated by ratio of energy density of the one or more lasers involved in the irradiation. ### Claim 10 (depends on 8) The method as claimed in claim 8, wherein at least one laser is focused onto a planar substrate plane, on the side of the transparent metallic IR reflection layer, and at least one laser is defocused. ### Claim 11 (depends on 1) The method as claimed in claim 1, wherein the electromagnetic irradiation of the transparent metallic IR reflection layer is carried out by continuously emitting diodes, by a CW gas discharge lamp or by an electron beam. ### Claim 12 (depends on 1) The method as claimed in claim 1, wherein the step of forming at least one low-emissivity layer comprises forming a plurality of layers for forming a low-emissivity layer system. ### Claim 13 (depends on 1) The method as claimed in claim 1, wherein the at least one transparent metallic IR reflection layer comprises silver. ### Claim 14 (depends on 1) The method as claimed in claim 1, carried out in an inline vacuum coating installation. ### Claim 15 (depends on 1) A low-emissivity layer system produced according to the method as claimed in claim 1. ### Claim 16 (depends on 3) The method as claimed in claim 3, wherein the emission wavelength of the electromagnetic radiation lies in a range of 250 nm to 350 nm and/or in a range of 650 nm to 850 nm. ### Claim 17 (depends on 8) The method as claimed in claim 8, wherein the one or more lasers comprise linear lasers. ### Claim 18 (depends on 1) The method as claimed in claim 1, wherein the at least one transparent metallic IR reflection layer comprises consists of silver.