# US 2014/0197330 A1 · Vibration isolation module and substrate processing system > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0197330 A1 - Document ID: US20140197330A1 - Status: Published application - Kind: A1 - Application number: 14/241,109 - Filed: 2012-09-10 - Published: 2014-07-17 - Earliest claimed: 2011-09-09 - Assignees: Mapper Lithography IP B.V. - Applicants: Mapper Lithography IP B.V. - Inventors: Jerry Johannes Martinus Peijster; Rogier Martin Lambert Ellenbroek; Guido De Boer - Web page: https://patentgrep.com/patent/US20140197330A1 ## CPC - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic - B82Y 40/00: Manufacture or treatment of nanostructures - F16F 15/04: using elastic means (single elements or their attachment F16F1/00 - F16F13/00); {(F16F15/023, F16F15/03 take precedence)} - G03F 7/70833: {Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground} - G03F 7/709: {Vibration, e.g. vibration detection, compensation, suppression or isolation} - H01J 37/02: Details - H01J 37/3177: {Multi-beam, e.g. fly's eye, comb probe} - F16F 15/085: {Use of both rubber and metal springs} - H01J 2237/0216: Means for avoiding or correcting vibration effects - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - F16F: SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract The invention relates to a vibration isolation module (101) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (102), an intermediate body (103) and a support body (104) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module. ## Claims ### Claim 1 Module (101) for isolating vibrations from a substrate processing apparatus such as a lithographic apparatus or inspection apparatus, the module comprising: a support frame (102); an intermediate body (103) connected to the support frame by means of at least one spring element (105) such that the intermediate body is a hanging body; and a support body (104) for accommodating the substrate processing apparatus, the support body being connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. ### Claim 2 (depends on 1) Module according to claim 1, wherein the position at which the at least one spring element is connected to the intermediate body is adjustable. ### Claim 3 (depends on 1, 2) Module according to claim 1 or 2, wherein the connection position of the at least one spring element is offset to a projection of a main axis of the at least one pendulum rod. ### Claim 4 Module according to any one of the preceding claims, wherein the module includes at least two pendulum rods, and wherein the positions at which the pendulum rods are connected to the intermediate body are adjustable. ### Claim 5 Module according to any one of the preceding claims, wherein the at least one spring element is a leaf spring (130). ### Claim 6 (depends on 5) Module according to claim 5, wherein the leaf spring comprises at least two substantially parallel elongated plates (131a,131b). ### Claim 7 (depends on 6) Module according to claim 6, wherein the plates of the leaf spring and the support frame form an integrated structure. ### Claim 8 (depends on 6, 7) Module according to claim 6 or 7, wherein the leaf spring comprises a damping element (133) positioned between the plates, wherein at least one side of the damping element facing the plates is covered with an anti-slip layer (137). ### Claim 9 (depends on 8) Module according to claim 8, wherein the anti-slip layer is a layer of polytetrafluoroethylene. ### Claim 10 (depends on 5, 6, 7) Module according to any one of claims 5-7, wherein the leaf spring comprises a damping element (133). ### Claim 11 (depends on 1, 2, 3, 4) Module according to any one of claims 1-4, further comprising a damping element for damping vibrations between the intermediate body and the support frame. ### Claim 12 Module according to any one of the preceding claims, wherein the at least one pendulum rod is provided with a damping element. ### Claim 13 (depends on 12) Module according to claim 12, wherein the damping element takes the form of a ring surrounding the rod. ### Claim 14 (depends on 12, 13) Module according to claim 12 or 13, wherein the damping element is moveable along the long axis of the rod. ### Claim 15 (depends on 8, 9, 10, 11, 12, 13, 14) Module according to any one of claims 8-14, wherein the damping element is made of a viscoelastic material. ### Claim 16 (depends on 15) Module according to claim 15, wherein the viscoelastic material comprises a fluoropolymer elastomer. ### Claim 17 Module according to any one of the preceding claims, wherein the at least one pendulum rod is provided with a flexure point. ### Claim 18 Module according to any one of the preceding claims, wherein the at least one pendulum rod is provided with two flexure points, the rod being connected to the intermediate body at a position above the upper flexure point, and being connected to the support body at a position below the lower flexure point. ### Claim 19 Module according to any one of the preceding claims, wherein the at least one pendulum rod has a length that exceeds the height of a column of the substrate processing apparatus. ### Claim 20 Module according to any one of the preceding claims, wherein the support body is provided with a damping element. ### Claim 21 Substrate processing system comprising a vibration isolation module (101) according to any one of the preceding claims, the system further comprising: a moveable target support structure for supporting a substrate to be exposed by the lithographic apparatus or inspection apparatus; and a control system for moving the module and the target support structure relative to each other. ### Claim 22 (depends on 21) System according to claim 21, wherein the substrate processing system is a lithography system, and wherein the support body accommodates a lithographic apparatus, the lithographic apparatus being a multi-beamlet charged particle lithographic apparatus. ### Claim 23 (depends on 22) System according to claim 22, wherein the multi-beamlet charged particle lithographic apparatus comprises: a beam generator for generating a plurality of charged particle beamlets; a beamlet blanker array for patterning the plurality of beamlets in accordance with a pattern; and a projection system for projecting the patterned beamlets onto a target surface of a substrate provided on the target support structure.