# US 2014/0197328 A1 · Ion Beam System and Method of Operating an Ion Beam System > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0197328 A1 - Document ID: US20140197328A1 - Status: Published application - Kind: A1 - Application number: 14/218,563 - Filed: 2014-03-18 - Published: 2014-07-17 - Earliest claimed: 2010-10-01 - Assignees: Carl Zeiss Microscopy GmbH - Applicants: Carl Zeiss Microscopy GmbH - Inventors: Josef Biberger; Ralph Pulwey; Andreas Adolf - Web page: https://patentgrep.com/patent/US20140197328A1 ## CPC - H01J 3/26: Arrangements for deflecting ray or beam - H01J 3/14: Arrangements for focusing or reflecting ray or beam (H01J3/02, H01J3/04 take precedence) - H01J 37/1477: {electrostatic} - H01J 37/28: with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} - H01J 37/317: for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation (H01J37/36 takes precedence) - H01J 2237/303: Electron or ion optical systems - H01J 2237/31749: Focused ion beam - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width. ## Claims ### Claim at position 1 1-12. (canceled) ### Claim 13 A method of operating an ion beam system, wherein the method comprises: accelerating ions of an ion beam to a first kinetic energy and deflecting the ion beam into a first direction using an electric deflection field having a first field distribution along the ion beam; and, subsequently, accelerating ions of the ion beam to a second kinetic energy and deflecting the ion beam into the first direction using the electric deflection field having a second field distribution along the ion beam; wherein the first kinetic energy is greater then the second kinetic energy; and wherein a width of the first field distribution is greater than a width of the second field distribution. ### Claim 14 (depends on 13) The method according to claim 13, wherein the accelerating of the ions of the ion beam to the first kinetic energy and the deflecting of the ion beam into the first direction further comprises deflecting the ion beam into a second direction opposite to the first direction using an electric deflection field having a third field distribution along the ion beam; wherein the accelerating of the ions of the ion beam to the second kinetic energy and the deflecting of the ion beam into the first direction further comprises deflecting the ion beam into the second direction using an electric deflection field having a fourth field distribution along the ion beam; wherein a mean position along the ion beam of the third field distribution is located downstream of a mean position along the ion beam of the first field distribution; wherein a mean position along the ion beam of the fourth field distribution is located downstream of a mean position along the ion beam of the second field distribution. ### Claim 15 (depends on 14) The method according to claim 14, wherein a distance between the mean position along the ion beam of the first field distribution and the mean position along the ion beam of the third field distribution is greater than a distance between the mean position along the ion beam of the second field distribution and the mean position along the ion beam of the fourth field distribution. ### Claim 16 (depends on 15) The method according to claim 15, further comprising focusing the ion beam using a focusing lens located downstream of the electric deflection field. ### Claim 17 (depends on 14) The method according to claim 14, wherein the mean position along the ion beam of the fourth field distribution is located downstream of the mean position along the ion beam of the third field distribution. ### Claim 18 (depends on 17) The method according to claim 17, further comprising focusing the ion beam using a focusing lens located downstream of the electric deflection field. ### Claim 19 (depends on 14) The method according to claim 14, wherein the mean position along the ion beam of the second field distribution is located downstream of the mean position along the ion beam of the first field distribution. ### Claim 20 (depends on 19) The method according to claim 19, further comprising focusing the ion beam using a focusing lens located downstream of the electric deflection field. ### Claim 21 (depends on 14) The method according to claim 14, further comprising accelerating ions of the ion beam to a third kinetic energy, deflecting the ion beam into the first direction using the electric deflection field having a fifth field distribution along the ion beam, and deflecting the ion beam into the second direction using the electric deflection field having a sixth field distribution along the ion beam; wherein the second kinetic energy is greater then the third kinetic energy; wherein the width of the second field distribution is greater than a width of the fifth field distribution; wherein the width of the fourth field distribution is greater than a width of the sixth field distribution; and wherein a mean position along the ion beam of the sixth field distribution is located downstream of a mean position along the ion beam of the fifth field distribution. ### Claim 22 (depends on 21) The method according to claim 21, further comprising focusing the ion beam using a focusing lens located downstream of the electric deflection field. ### Claim 23 (depends on 21) The method according to claim 21, wherein a distance between the mean position along the ion beam of the second field distribution and the mean position along the ion beam of the fourth field distribution is greater than a distance between the mean position along the ion beam of the fifth field distribution and the mean position along the ion beam of the sixth field distribution. ### Claim 24 (depends on 23) The method according to claim 23, further comprising focusing the ion beam using a focusing lens located downstream of the electric deflection field. ### Claim 25 (depends on 21) The method according to claim 21, wherein the mean position along the ion beam of the fifth field distribution is located downstream of the mean position along the ion beam of the second field distribution. ### Claim 26 (depends on 25) The method according to claim 25, further comprising focusing the ion beam using a focusing lens located downstream of the electric deflection field. ### Claim 27 (depends on 21) The method according to claim 21, wherein the mean position along the ion beam of the sixth field distribution is located downstream of the mean position along the ion beam of the fourth field distribution. ### Claim 28 (depends on 27) The method according to claim 27, further comprising focusing the ion beam using a focusing lens located downstream of the electric deflection field.